Light Stabilizers / UV Absorbers > Hindered Amines (HALS)

ADK STAB LA-63P s a high molecular weight, N-methylated, oligomeric, high molecular weight HALS (hindered amine light stabilizer). It shows an excellent UV protection by scavenging radicals... view more

ADK STAB LA-72 is a conventional liquid HALS. The main component is N-CH3. Has good dispersibility/solubility in sealants etc... view more

ADK STAB LA-77Y is a conventional low molecular weight N-H-type HALS. It shows an excellent UV protection by scavenging radicals generated by photo degradation. ADK STAB LA-77Y provides an excellent... view more

ADK STAB LA-81 by Adeka Corporation is a high performing, third generation HALS (hindered amine light stabilizer). It can stabilize polymers against photo-degradation even in strong acidic... view more

Chimassorb® 944 FDL by BASF is a high molecular weight hindered amine HALS functions as light stabilizer. It has low volatility and offers excellent compatibility and good resistance to extraction... view more

Tinuvin® 123 by BASF is a liquid hindered amine light stabilizer (HALS) based on an amino-ether functionality. It has low volatility. Its performance can be significantly improved when used in... view more

Tinuvin® 123-DW by BASF is hindered amine light stabilizer (HALS). Tinuvin® 123-DW is used in water-based adhesives... view more

Tinuvin® 144 by BASF is a light stabilizer of the hindered amine class (HALS). Tinuvin® 144 is used in hot melt, reactive, solvent-based and radiation curing adhesives and sealants... view more

Tinuvin® 152 by BASF is a high performance hindered amine light stabilizer (HALS). Tinuvin® 152 is used in hot melt, reactive, solvent-based and radiation curing adhesives and sealants... view more

Tinuvin® 292 by BASF is a liquid hindered amine light stabilizer. Tinuvin® 292 is used in hot melt, reactive, solvent- & water- based and radiation curing adhesives and sealants... view more