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The material selection platform
Adhesives Ingredients
The material selection platform
Adhesives Ingredients

Sulfur-based Monomers

30
Product Name
Supplier
Description
Gelest (Mitsubishi Chemical)
CS-AHPS by Gelest (Mitsubishi Chemical) is sodium 1-allyloxy-2-hydroxypropyl sulphonate. It is sodium salt of an allyl ether sulphonate supplied as a 40% solution in water. CS-AHPS has copolymerizable anionic... view more
Gelest (Mitsubishi Chemical)
DVP-010 by Gelest (Mitsubishi Chemical) is ammonium allylpolyethoxy (10) sulphate. It is a yellow viscous liquid. Exhibits excellent mechanical and chemical stability, as well as good water resistance. DVP-010... view more
Kowa 3MPA is a ß-mercaptopropionic acid / 3-mercaptopropionic acid. It is a sulfur-based monomer. Used in adhesives... view more
Kowa DPMP by Kowa is a dipentaerythritol-hexakis-(3-mercaptopropionate). It is a sulfur-based monomer. Used in adhesives... view more
Kowa DTDPA is a dithiodipropionic acid. It is a sulfur-based monomer. Used in adhesives... view more
Kowa EHMP is a 2-ethylhexyl-3-mercaptopropionate. It is a sulfur-based monomer. Used in adhesives... view more
Kowa M3MP by Kowa is a methyl-3-mercaptopropionate. It is a sulfur-based monomer. Used in adhesives... view more
Kowa MPM is a methyl-3-mercaptopropionate. It is a sulfur-based monomer. Used in adhesives... view more
Kowa N-SVS-25C is a sodium vinyl sulfonate (aqueous solution). It is a sulfur-based monomer. Used in adhesives... view more
Kowa NONP is a n-octyl 3-mercaptopropionate. It is a sulfur-based monomer. Used in adhesives... view more
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