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The material selection platform
Adhesives Ingredients
The material selection platform
Adhesives Ingredients
by SpecialChem
 
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29 products match your search
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Fluorcarbon containing organically modified polysiloxane. Used in water based, hotmelt, solvent based, reactive and radiation curing adhesives and in sealants. Acts as a wetting agent. Offers... view more
Solvent-free modified polysiloxane. Used in hotmelt, solvent based, reactive and radiation curing adhesives and in sealants. Acts as a wetting agent. Offers benefits such as improved levelling and... view more
Fluorcarbon modified polymer. Used ini hotmelt, solvent based, reactive and radiation curing adhesives and in sealants. Acts as a wetting agent. Offers benefits such as improves levelling, prevents... view more
Fluorcarbon modified polymer. Used in hotmelt, solvent based, reactive and radiation curing adhesives and in sealants. Acts as a wetting agent. Offers benefits such as improves levelling, prevents... view more
High-molecular weight unsaturated carboxylic acid, combined with a very compatible organically modified polysiloxane. Used in hotmelt, solvent based, reactive and radiation curing adhesives and in... view more
Fatty acid modified polyester. Used in water based, hotmelt, solvent based, reactive and radiation curing adhesives and in sealants. Acts as a thickener... view more
Fatty acid modified polyester. Used in water based, hotmelt, solvent based, reactive and radiation curing adhesives and in sealants. Acts as a thickener... view more
Aliphatic polyether with acidic groups. Used in hot melt, solvent based, reactive, water based and radiation curing adhesives ans in sealants. Acts as a dispersing agent. Offers benefits such as... view more
Solution of defoaming substances, silicone free. Used in hot melt, solvent based, reactive and radiation curing adhesives and in sealants. Offers support to the quick de-aeration of thermosetting... view more
High performance organophosphite processing stabilizer. Used in hot melt and solvent adhesives and in sealants. Offers benefits such as protection against thermo-oxidative degradation during... view more
Irganox® 1726 is a multifunctional phenolic antioxidant. It contains 4,6-bis (dodecylthiomethyl)-o-cresol. It is non-staining, non-discoloring, low in volatility, resistant to extraction, and stable... view more
1,2,5-triazine-2,4,6 (1H,3H,5H)-trione, compound with 1,3,5 triazine-2,4,6 triamine (1:1). Used in hotmelt, reactive, solvent based, radiation curing and water based adhesives and sealants. Acts as... view more
2,5-thiophenediylbis(5-tert-butyl-1,3-benzoxazole). Used in hotmelt, solvent based, water based, reactive and radiation curing adhesives and in sealants. Offers benefits such as brilliant bluish... view more
Liquid UV absorber of the hydroxyphenylbenzotriazole class. Used in hotmelt, reactive, solvent based, water based and radiation curing adhesives and sealants... view more
Decanedioic acid, bis(2,2,6,6-tetramethyl-1-(octyloxy)-4-piperidinyl)ester, reaction products with 1,1-dimethylethylhydroperoxide and octane. Used in sealants and hotmelt, reactive, solvent based... view more
Light stabilizer of the hindered amine class (HALS). Used in hot melt, reactive, solvent based and radiation curing adheives and sealants... view more
High-performance hindered amine light stabilizer (HALS). Used in hot melt, reactive, solvent based and radiation curing adheives and sealants... view more
2-(2H-benzotriazol-2-yl)-4,6-bis(1-methyl-1-phenylethyl)phenol. Used in hotmelt, solvent based, reactive and radiation curing adhesives and sealants for molded articles, films, sheets and fibers... view more
Liquid hindered amine light stabilizer. Used in hot melt, reactive, solvent based, water based and radiation curing adhesives and sealants... view more
Phenol, 2-(5-chloro-2H-benzotriazole-2-yl)-6-(1,1-dimethylethyl)-4-methyl. Used in hot-melt, solvent based, reactive and radiation-curing adhesives and sealants. Acts as a UV absorber of the... view more
Blend of Benzenepropanoic acid, 3-(2H-benzotriazol-2-yl)-5-(1,1- dimethylethyl)-4-hydroxy-, C7-9-branched and linear alkyl esters and 1-methoxy-2-propyl acetate. Used in hotmelt, reactive, solvent... view more
Liquid, high performance UV Absorber. Used in hotmelt, reactive, solvent based, water based and radiation curing adhesives and sealants... view more
Hydroxyphenyl-triazine (HPT) UV absorber. Used in hotmelt, reactive, solvent based and radiation curing adhesives and sealants. Offers characteristics such as protection against gloss reduction... view more
Liquid light stabilizer blend. Used in hotmelt, reactive, solvent based and radiation curing adhesives and sealants... view more
High molecular weight oligomeric hindered amine. Used in hotmelt, reactive, solvent based and radiation curing adhesives and sealants. Acts as light stabilizer and antioxidant. Offers long- term... view more
Bis(2,2,6,6,-tetramethyl-4-piperidyl)sebaceate. Used in hotmelt, reactive, solvent based and radiation curing adhesives and sealants. Acts as a hindered amine light stabilizer (HALS). Offers... view more
Synergistic mixture of oligomeric hindered amine stabilizer. Used in hotmelt, reactive, solvent based and radiation curing adhesives and sealants. Possesses good extraction resistance, low gasfading... view more
2-(2H-Benzotriazol-2-yl)-6-(1-methyl-1-phenylethyl)-4-(1,1,3,3-tetramethylbutyl)phenol. Used in hotmelt, reactive, solvent based and radiation curing adhesives and sealants. Acts as a UV absorber of... view more
Blend of Benzenepropanoic acid, 3-(2H-benzotriazol-2-yl)-5-(1,1- dimethylethyl)-4-hydroxy-, C7-9-branched and linear alkyl esters and 1-methoxy-2-propyl acetate. Used in hotmelt, reactive, solvent... view more
Nynas Naphthenic Process Oils
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