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The material selection platform
Adhesives Ingredients
The material selection platform
Adhesives Ingredients
by SpecialChem
 
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17 products match your search
Product Name
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Description
Liquid UV absorber of the hydroxyphenylbenzotriazole class. Used in hotmelt, reactive, solvent based, water based and radiation curing adhesives and sealants... view more
Decanedioic acid, bis(2,2,6,6-tetramethyl-1-(octyloxy)-4-piperidinyl)ester, reaction products with 1,1-dimethylethylhydroperoxide and octane. Used in sealants and hotmelt, reactive, solvent based... view more
Light stabilizer of the hindered amine class (HALS). Used in hot melt, reactive, solvent based and radiation curing adheives and sealants... view more
High-performance hindered amine light stabilizer (HALS). Used in hot melt, reactive, solvent based and radiation curing adheives and sealants... view more
2-(2H-benzotriazol-2-yl)-4,6-bis(1-methyl-1-phenylethyl)phenol. Used in hotmelt, solvent based, reactive and radiation curing adhesives and sealants for molded articles, films, sheets and fibers... view more
Liquid hindered amine light stabilizer. Used in hot melt, reactive, solvent based, water based and radiation curing adhesives and sealants... view more
Phenol, 2-(5-chloro-2H-benzotriazole-2-yl)-6-(1,1-dimethylethyl)-4-methyl. Used in hot-melt, solvent based, reactive and radiation-curing adhesives and sealants. Acts as a UV absorber of the... view more
Blend of Benzenepropanoic acid, 3-(2H-benzotriazol-2-yl)-5-(1,1- dimethylethyl)-4-hydroxy-, C7-9-branched and linear alkyl esters and 1-methoxy-2-propyl acetate. Used in hotmelt, reactive, solvent... view more
A liquid hydroxyphenyl-triazine (HPT) UV absorber. Used in hotmelt, reactive, solvent based, water based and radiation curing adhesives and sealants... view more
Liquid, high performance UV Absorber. Used in hotmelt, reactive, solvent based, water based and radiation curing adhesives and sealants... view more
Hydroxyphenyl-triazine (HPT) UV absorber. Used in hotmelt, reactive, solvent based and radiation curing adhesives and sealants. Offers characteristics such as protection against gloss reduction... view more
Liquid light stabilizer blend. Used in hotmelt, reactive, solvent based and radiation curing adhesives and sealants... view more
High molecular weight oligomeric hindered amine. Used in hotmelt, reactive, solvent based and radiation curing adhesives and sealants. Acts as light stabilizer and antioxidant. Offers long- term... view more
Bis(2,2,6,6,-tetramethyl-4-piperidyl)sebaceate. Used in hotmelt, reactive, solvent based and radiation curing adhesives and sealants. Acts as a hindered amine light stabilizer (HALS). Offers... view more
Synergistic mixture of oligomeric hindered amine stabilizer. Used in hotmelt, reactive, solvent based and radiation curing adhesives and sealants. Possesses good extraction resistance, low gasfading... view more
2-(2H-Benzotriazol-2-yl)-6-(1-methyl-1-phenylethyl)-4-(1,1,3,3-tetramethylbutyl)phenol. Used in hotmelt, reactive, solvent based and radiation curing adhesives and sealants. Acts as a UV absorber of... view more
Blend of Benzenepropanoic acid, 3-(2H-benzotriazol-2-yl)-5-(1,1- dimethylethyl)-4-hydroxy-, C7-9-branched and linear alkyl esters and 1-methoxy-2-propyl acetate. Used in hotmelt, reactive, solvent... view more
Nynas Naphthenic Process Oils
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