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Applied Seals Joins SEMATECH's Mask Blank Defect Reduction Program to Explore Next Generation of Fillers

Published on 2011-11-11. Author : SpecialChem

ALBANY, NY and NEWARK, Calf. -- SEMATECH, a global consortium of chipmakers, announced that Applied Seals North America, Inc., a leading provider of elastomeric sealing for the semiconductor, pharmaceutical, biotechnology and solar industries, has joined SEMATECH's Mask Blank Defect Reduction program at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

Defect requirements for leading edge chip fabrication technologies are becoming ever more stringent and defect reduction must be achieved for chip manufacturing equipment at all levels - at the process and materials levels as well as the tool and tool component levels. Reducing the defects in the extreme ultraviolet (EUV) mask blank multilayer deposition system originating from sealing materials is one example of the defect management challenge the industry needs to address to enable cost effective insertion of this technology at the 22 nm half-pitch.

As a mask blank defect reduction member of SEMATECH's lithography division, Applied Seals will collaborate with SEMATECH engineers on critical methods for improving EUV mask blank yield to accelerate commercial manufacturing readiness, with the goal of eliminating defects originating from sealing materials.

"Our partnership with SEMATECH provides Applied Seals the opportunity for a new level of collaboration to find ways to develop the next generation of materials, polymers and fillers that will fit with both new process technologies and the hardware requirements of the future," said Dalia Vernikovsky, CEO of Applied Seals North America. "Applied Seals is committed to ensuring that sealing solutions continue to evolve and keep pace with advances in semiconductor production."

"We're looking forward to working with Applied Seals in our mutual effort to reduce defect levels and accelerate process availability for EUV pilot line manufacturing," said John Warlaumont, vice president of Advanced Technologies, SEMATECH. "Engineering with producers of critical EUV components is a key objective of SEMATECH's EUV Mask Blank Defect Reduction program and this partnership will help strengthen the program's ability to qualify seal performance in various applications."

"The attraction of Applied Seals to the roster of world-class companies at the UAlbany NanoCollege provides further resources to address the needs of the nanoelectronics industry and accelerate the introduction of EUV manufacturing," said Richard Brilla, CNSE vice president for strategy, alliances and consortia. "At the same time, it reinforces the global leadership of CNSE and New York state as a magnet for nanotechnology innovations and high-tech growth."

The partnership will be based on SEMATECH's extensive network of hardware and research expertise, semiconductor experience, and highly respected industry leadership and on Applied Seal's proven, industry-leading semiconductor materials and processes. SEMATECH's Mask Blank Defect Reduction program has developed world-class knowledge on the composition of very small defects, through sophisticated defect analysis capabilities and processes that include the use of tools such as the Titan TEM and an Auger tool for mask surface analysis located at CNSE's Albany NanoTech Complex.

SEMATECH's Mask Blank Defect Reduction program, one of several major R&D centers within CNSE's Albany NanoTech Complex, provides access to state-of-the-art mask and lithography tools and materials as well as immediate feedback and assistance from SEMATECH member company assignees working there.

About Applied Seals North America

Applied Seals sells and supports a range of sealing products used to create and maintain the integrity of ultraclean manufacturing environments. Seals are key components within virtually all production equipment used in processing semiconductors, solar panels, pharmaceuticals, ultrapure chemicals and other high-technology products. Prescribing the optimal seal for each application has been shown to increase manufacturing uptime, boosting production capacities without the expense of adding capital equipment. Applied Seals is dedicated to educating users about the performance attributes and correct applications of perfluoroelastomer (FFKM) seals to optimize the fit and lifetime of these products.

About CNSE

The UAlbany CNSE is the first college in the world dedicated to education, research, development and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience and nanoeconomics. With more than $12 billion in high-tech investments, CNSE represents the world's most advanced university-driven research enterprise, offering students a one-of-kind academic experience and providing over 300 corporate partners with access to an unmatched ecosystem for leading-edge R&D and commercialization of nanoelectronics and nanotechnology innovations. CNSE's footprint spans upstate New York, including its Albany NanoTech Complex, an 800,000-square-foot megaplex with the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 85,000 square feet of Class 1 capable cleanrooms. More than 2,600 scientists, researchers, engineers, students and faculty work here, from companies including IBM, Intel, GlobalFoundries, SEMATECH, Samsung, TSMC, Toshiba, Applied Materials, Tokyo Electron, ASML and Novellus Systems.

Source: SEMATECH


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