GABEPRO™ GPE-228 by Huntsman is a bis(3,4- epoxycyclohexylmethyl) adipate. Acts as flexibilizing cycloaliphatic epoxy resin. It reacts in the presence of acid anhydride curing agents at higher. With... view more

HYPOX® DA323 by Huntsman is dimer acid adducted to an epoxidized Bisphenol-A resin. It is usually blended with other epoxy resins and diluents to improve thermal shock and impact resistance... view more

HYPOX® RA 95 by Huntsman is a high viscosity, bisphenol A epoxy resin modified butadeine-acrylonitrile elastomer. It exhibits higher temperature performance and greater green strength, making it... view more

Hardener XB 3473 by Huntsman is a latent polyamine based hardener. It allows parts manufacture to tailor specific formulation processing characteristics and cured polymer properties. Hardener XB... view more

Matrimid® 2292 by Huntsman is a diallyl ether of bisphenol-A based low viscosity resin. Used as a reactive diluent with epoxy, bismaleimide and polyimides. Exhibits excellent mechanical properties... view more

Omnilane OC1005 by IGM Resins is a cycloaliphatic epoxide. It offers low viscosity, good fluidity, flexibility, long term stability, high reactivity and hardness. It is also used as a casting resin, in... view more

Omnilane OC3005 by IGM Resins is a flexible cycloaliphatic epoxide resin. It is used in which a higher viscosity or more flexible film is required. Omnilane OC3005 is suitable for adhesives, graphic arts and... view more

Omnipol ASA by IGM Resins is a polymeric amine, synergist photoinitiator. It offers low migration, low odor and low volatility. It has excellent performance in black and heavily pigmented systems in... view more

Omnirad 1700 by IGM Resins is a versatile liquid Photoinitiator for radical polymerisation. It is based upon Omnirad 403 & exhibits excellent high reactivity and may be used in high-end optical... view more

Omnirad 81 by IGM Resins is an eutectic photoinitiator. It is a blend of benzophenone and 4-Methylbenzophenone. It exhibits excellent solubility properties. It is an ideal photo-catalyst for UV... view more