Efka® SL 3236 by BASF is solvent-free modified polysiloxane. Used in hotmelt, solvent based, reactive and radiation curing adhesives and in sealants. Acts as a wetting agent. Offers benefits such as... view more

Irgacure® 1173 by BASF acts as a photoinitiator. It is composed of 2-hydroxy-2-methyl-1-phenyl-propan-1-one. Used in reactive and radiation curing adhesives. Irgacure® 1173 exhibits very good... view more

Irgacure™ 1800 by BASF is a blend of bis(2,6-dimethoxybenzoyl)-2,4,4-trimethyl pentylphosphineoxide and of 1-hydroxy-cyclohexyl-phenyl-ketone. Designed for reactive and radiation curing adhesives... view more

Irgacure™ 1870 by BASF is blend of bis(2,6-dimethoxybenzoyl)-2,4,4-trimethyl pentylphosphineoxide and of 1-hydroxy-cyclohexyl-phenyl-ketone. Designed for reactive and radiation curing adhesives... view more

Irgaguard® B 5000 by BASF is an inorganic silver zeolite-based antimicrobial. Used in hot-melt, reactive and radiation curing adhesives and sealants for plastics and rubber industries. Designed for... view more

Irgaguard® B 6000 by BASF is an inorganic silver glass zeolite based antimicrobial. Used in hotmelt, reactive and radiation curing adhesives and sealants for transparent applications such as films... view more

Inorganic silver glass based antimicrobial. Used in hotmelt, reactive and radiation curing adhesives and sealants for plastics and rubber such as air conditioning, filter, fabrics, sanitary... view more

Melapur™ 200 by BASF is melamine-polyphosphate which acts as a halogen-free flame retardant for glass fiber reinforced polyamide 66. Possesses additional handling and processing advantages. It is... view more

Melapur™ MC25 by BASF is an effective flame retardant. It offers good mechanical properties and lower specific gravity compared to compounds containing halogen & antimony flame retardant systems... view more

Melapur™ MP by BASF is a halogen-free flame retardant. Designed for hot-melt, reactive and radiation curing adhesives and sealants. Melapur™ MP offers lower smoke density, lower smoke toxicity and... view more

Tinuvin® 1130 by BASF is a liquid UV absorber of the hydroxyphenylbenzotriazole class. Exhibits high temperature and extraction resistance. Tinuvin® 1130 is used in hotmelt, reactive, solvent- &... view more

Tinuvin® 123 by BASF is a liquid hindered amine light stabilizer (HALS) based on an amino-ether functionality. It has low volatility. Its performance can be significantly improved when used in... view more

Tinuvin® 144 by BASF is a light stabilizer of the hindered amine class (HALS). Tinuvin® 144 is used in hot melt, reactive, solvent-based and radiation curing adhesives and sealants... view more

Tinuvin® 152 by BASF is a high performance hindered amine light stabilizer (HALS). Tinuvin® 152 is used in hot melt, reactive, solvent-based and radiation curing adhesives and sealants... view more

Tinuvin® 234 by BASF is a high molecular weight ultraviolet light absorber (UVA) of the hydroxy phenyl benzotriazole class. Possesses features such as low volatility, very good light absorbing... view more

Tinuvin® 292 by BASF is a liquid hindered amine light stabilizer. Tinuvin® 292 is used in hot melt, reactive, solvent- & water- based and radiation curing adhesives and sealants... view more

Tinuvin® 326 by BASF is an UV absorber of the hydroxyphenylbenzotriazole class. Offers low volatility at high temperatures, high resistance to thermal degradation and light stability to plastics... view more

Tinuvin® 384-2 by BASF is a blend of benzenepropanoic acid, 3-(2H-benzotriazol-2-yl)-5-(1,1-dimethylethyl)-4-hydroxy-, C7-9-branched and linear alkyl esters and 1-methoxy-2-propyl acetate. Acts as... view more

Tinuvin® 477 is a liquid, high performance UV absorber by BASF. It is hydroxy-phenyl-s-triazine UV absorber with 18-20% 2-methoxy-1-propyl-acetate. Tinuvin® 477 is used in hotmelt, reactive... view more

Tinuvin® 477-DW by BASF is an aqueous UV absorber dispersion. It is based on a red shifted hydroxy-phenyl- s-triazine chromophore. Tinuvin® 477-DW is used in reactive, water-based and radiation... view more