Esacure KIP 100 F by IGM Resins is a photoinitiator. It is a liquid mixture of Esacure KIP 150 (70% ) and Omnirad 1173 (30%). It offers high reactivity, low odor and color stability. This grade is... view more

Esacure KIP 150 by IGM Resins is an oligomeric polyfunctional alpha-hydroxyketone based photoinitiator with low VOC. It offers high reactivity, non-yellowing properties, no migration and low odor. It... view more

Omnicat 432 by IGM Resins is a UV-photointiator based on the mixture of triarylsulfonium hexafluorophosphate salts and propylene carbonate. It offers through- & surface care. It is recommended for... view more

Omnilane OC1005 by IGM Resins is a cycloaliphatic epoxide. It offers low viscosity, good fluidity, flexibility, long term stability, high reactivity and hardness. It is also used as a casting resin, in... view more

Omnimer ACMO by IGM Resins is a monofunctional, UV reactive diluent for UV and EB radiation curable formulations. It exhibits excellent heat resistance, low viscosity and low odor. It shows good... view more

Omnipol 910 by IGM Resins is a polymeric Type I photoinitiator. It is based on aminoalkylphenone photoinitiator class. It shows strong UV Chromophore in the UV-B region and exhibits low odor. It is... view more

Omnipol ASA by IGM Resins is a polymeric amine, synergist photoinitiator. It offers low migration, low odor and low volatility. It has excellent performance in black and heavily pigmented systems in... view more

Omnipol TP by IGM Resins is a highly efficient polymeric Type I photoinitiator. It is based on TPO-L. It offers high reactivity and low odor. Due to its absorption spectrum, it is suitable for UV... view more

Omnirad 1700 by IGM Resins is a versatile liquid Photoinitiator for radical polymerisation. It is based upon Omnirad 403 & exhibits excellent high reactivity and may be used in high-end optical... view more

Omnirad 991 by IGM Resins is a Type II Photoinitiator that can be easily used in corporations with classic Amine Synergists or Amine Acrylates in and clear systems. It exhibits faster cure and... view more

Omnirad MBF by IGM Resins is a highly efficient, free-radical, type II photoinitiator. It is designed for surface cure, clear-, white-, pigmented- and water-based systems. It forms free radicals... view more

Omnistab 1130 by IGM Resins is a liquid type UV absorber and can be used in combination with hindered amine light stabilizers (HALS). It provides efficient protection to light sensitive... view more

Omnistab 123 by IGM Resins is a liquid HALS stabilizer. It is based on amino ether functionality. It offers low basicity and also enables easy emulsification into waterborne systems. Improved property... view more

Omnistab IN 515 by IGM Resins is an effective liquid polymerization inhibitor or storage stabilizer for photosensitive resins and monomers. It is effective and has excellent performance in a wide range of... view more

Omnistab IN 518 by IGM Resins is an effective liquid polymerization inhibitor or storage stabilizer for photosensitive resins and monomers. Product properties will depend on the actual reactive monomers... view more

Omnistab LS 292 by IGM Resins is bis (1,2,2,6,6-pentamethyl-4-piperidyl) sebacate. Acts as a hindered amine light stabilizer. It provides outstanding light stability It offers excellent protection... view more

Omnistab PTZ by IGM Resins is an inhibitor for acrylate and methacrylate production to prevent polymerization as well as UV/EB formulations. Product properties will depend on the actual reactive... view more

Omnivad® Mirroflex SB 50% by IGM Resins is a photoinitiator. It offers high gloss, flexibility, good film hardness, moderate chemical resistance and provides exceptional clarity, good resistance to ultraviolet... view more

Omnivadd EP 4029 by IGM Resins is a VOC- and solvent-free high molecular weight wetting and dispersing additive. It offers high levels of gloss, improved colour strength, increased transparency and the... view more

Omnivadd SF 3777 by IGM Resins is a silicone-free additive having high molecular weight and very broad compatibility. It reduces the surface tension of various resin systems at the substrate interface. It... view more